Electron beam ion source

An electron beam ion source (EBIS) is a device used in atomic physics to produce highly charged ions by bombarding atoms with a powerful electron beam. Its principle of operation is shared by the Electron beam ion trap.

References

• Ian G. Brown, Physics and Technology of Ion Sources, John Wiley & Sons Inc (1989), ISBN 978-0471857082
• H. F. Beyer, H.-J. Kluge, V. P. Shevelko, in: X-ray Radiation of Highly Charged Ions, Springer Series on Atoms and Plasmas, Springer Verlag, Berlin-Heidelberg 1997